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RIE technology

top electrode with shower head gas inlet

substrate electrode with 13 MHz Generator and Automatch (AMU)

substrate electrode water cooled

System control: PLC (programmable logic controller) and PC 2000

Turbo or Roots pump with dual stage rotary as backing pump

gate valve and APC (automatic pressure) control valve

pressure reading: CM gauge for process (Capacitance Manometer)

additional Penning for base pressure

gas pod with 6/ 12 MFC controlled gas lines (Mass Flow Controller)

schematic: RIE parallel plate reactor