Cross-sectional view by scanning electron
microscopy (SEM) of 40 nm pitch grating into HSQ film (top) and
after deposition of around 4 nm of alumina film (bottom). A 2–3
gold film has been deposited to prevent from charging. The
trench height for both patterns is ~30nm.
C. Peroz, S. Dhuey, M. Cornet, M. Vogler, D. Olynick, S. Cabrini,
Nanotechnology, 23 (2012) 015305
Open Loaded ALD
Atomic Layer Deposition
ALD can deposit
highly conformal decorative coatings.
Highly conformal SiO2 growth by
remote plasma ALD
over a 30 : 1 aspect ratio trench