Courtesy of TU Eindhoven
Using either O2 plasma or O3 gas, Al2O3
can be deposited at room temperature with good material quality.
metal precursor: TMA (tri methyl aluminium)
non metal precursor: O3
Ozone is more reactive then H2O,
but not as reactive as O radicals.
Ozone is sometimes preferred anyway,
when O radicals recombine to fast
for high aspect ratios.
valve between remote ICP source
spectroscopic ellipsometry optional