Plasma Technology  


OPT application lab:
The laser shows the decrease in reflected
light during the formation of black Si.


Courtesy of X Fab Erfurt
Adam Williamson

Black Si by Dry Etching


OPT application lab:
black Si by ICP RIE: 300 nm high


Plasmalab System 100


Plasmalab 80 Plus


OPT application lab:
black Si by RIE


ICP RIE technology


RIE technology

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