Plasma Technology  

 

high TMB and TMP flows
pre anneal

 

high TMB and TMP flows
post anneal

Plasmalab System 100
with vacuum loadlock

BPSG PECVD using TMP and TMB for Planarisation

medium TMB and TMP flows
pre anneal

 

medium TMB and TMP flows
post anneal

 


SiO2 PECVD with B and P doping for “planarisation”
Annealing at 1000 °C.

TEOS with varying flows of TMB and TMP

 

with kind permission of
Sergio Doneda
INPHOTEC, the Integrated Photonic Technologies Center of the Institute of Communication, Information and Perception Technologies of Scuola Superiore Sant’Anna- Pisa

 

low TMB and TMP flows
pre anneal

low TMB and TMP flows
post anneal

PECVD technology

link to homepage email to OPT