Plasma Technology  

 

with kind permission of
Molecular Foundry
at Lawrence Berkeley National Laboratory:

Temperature dependence of the profile for constant O2 flow

 

with kind permission of
Dr Deirdre Olynick, Molecular Foundry
at Lawrence Berkeley National Laboratory:

O2 flow dependence of the profile for constant temperature

Deep Si Etching by Cryo ICP: Profile Control


Plasmalab System 100
with ICP180 and loadlock

 

Z.W. Liu, Y. Wu, B. Harteneck, D. Olynick,
Nanotechnology, 24 (2013)

 


ICP technology


 

 

 

 

 

 

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