Plasma Technology  

DWDM - Ion Beam Deposition


Ion Beam Deposition
filamentless RF source, filamentless PBN

Application: 100GHz and 50GHz DWDM Thin Film Filter

Uniform Area:
50 - 95mm radius on 200mm diameter substrate (20,5mm²)

Deposition Rate:
Ta2O5 3.35Å /sec (1000eV, 450mA)
SiO2    3.00Å /sec (1000eV, 450mA

Uniformity
Uniformity across defined substrate area (50 - 95 mm radius) +/-0.03%.
Repeatability substrate to substrate +/- 0.03%

Refractive Index
Ta2O5 2.065 +/- 0.002 @ 1550 nm
SiO2    1.470 +/- 0.001 @ 1550 n

Film Stress Control
Stress can be controlled down to 150 - 200 MPa

Typical Run Time
One three cavity (104 layer) DWDM filter run: 21 hour


typical ion beam layout


Optofab 3000
= Ionfab 300 Plus modified to
achieve very high rates
at very good uniformities

link to homepage email to OPT