Plasma Technology  

Dr Law uses the Plasmalab 80  RIE system for the  CH4/ H2 based RIE process.

The photo shows the Plasmalab 80 Plus, which has replaced the Plasmalab 80

with kind permission of:
  Cavendish Labs
  Dr Vic Law

RIE technology

Plasmalab 80 Plus

GaAs Quantum Dots MO-RIE



0.2 µm x 0.2 µm quantum dots
aspect ratio 5 : 1
negative e beam resist

CH4/ H2 based GaAs "MO-RIE"

5 µm deep anisotropic etch
Photoresist mask
rate 30 nm/ min
Selectivity to Al0.3Ga0.7As 45 : 1
rates: InP>GaInAs>GaAs>AlGaAs

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