Plasma Technology  


The IBM dual chamber ion beam cluster of the 300 series is configured for CAIBE in one chamber and ion beam deposition in the second chamber. Both chambers share a "transfer vacuum loadlock".

The photo and graph show the Ionfab 300 Plus with RF source, which has replaced the Ionfab 300 with 15 cm Kaufman source installed at IBM Zuerich.

with kind permission of:
  IBM Zuerich
  Dr P Buchmann


with kind permission of IBM Zuerich:
MQW Ridge Waveguide Laser


Ionfab 300 Plus
with vacuum loadlock

GaAs/ AlGaAs CAIBE for laser mirrors



ion beam etching:
CAIBE or RIBE


with kind permission of IBM Zuerich:
MQW Ridge Waveguide Laser

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