Plasma Technology  

SEM

OPT application lab: 
lens tranferred from PR into GaP


SEM

OPT application lab: 
lens tranferred from PR into GaP


Plasmalab System 100
with ICP380

GaP Lens Etching by ICP

 

By the ICP - RIE dry etch technology
 lens patterns can be transferred
 from photoresist into GaP.

rate > 1 Ķm/ min
uniformity +/- 3 % over 100 mm
selectivity GaP : PR adjustable
process: Cl based
surface: smooth


ICP Technology

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