GdN is a ferromagnetic, conducting material with applications in Spintronic
Deposition on an OpAL with
and N2 plasma
No defined ALD window
with kind permission of
Dr Richard Potter
University of Liverpool
et al, Journal of Crystal Growth 338 (2012)
Why remote plasma ALD ?
A "remote plasma" makes sure, the substrates
are NOT in contact with the plasma !
The remote plasma just cracks molecules,
so that very reactive species can be used for
the growth process.
Such reactive species often enable
efficient plasma preclean/ conditioning of the
substrates, lead to cleaner films and lower
the deposition temperature.
In Oxford systems it is possible to
ALD processes using
- the thermal only method
- ozone assisted processes
- remote plasma assisted processes
together without any hardware change.
Multiple step processes using all technologies
can be chosen from the software.