Plasma Technology  


266nm UV mirror transmission spectrum
measured on Cary 500 spectrophotometer


Ionfab 300 Plus

 


Ion Beam Deposition
from a Hf metal and SiO2 target
with O2 assist

UV mirror by IBS HfO2/ SiO2

 

266 nm UV mirror

28 layer 266 nm mirror (HL)^14
Layer materials H = HfO2, L = SiO2
Process gases Argon, Oxygen
Deposition rate > 12 nm/ min (SiO2)
> 7 nm/min (HfO2)
Uniformity <± 0.2 % over 1 optic
Substrate 1 fused silica
held in 8 carrier plate

Mirror Performance:
Centre wavelength (663.7 nm)

HfO2 Ion Beam Sputtering:

Deposition rate: > 7.0 nm/ min

Uniformity: <± 0.5 % over 75 mm thick annulus

<± 0.1 % over 10 mm thick annulus
centred at 75 mm substrate radius

Refractive index: 2.112 (632.8 nm)

 

 

transmission spectrum model

Theoretical Model: UV mirror at 0° AOI (solid) and 45° AOI (dashed)

System:

Optofab 3000
= Ionfab 300 Plus modified to achieve
very high rates at excellent uniformities
over small substrates

 

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