Plasma Technology  

Ionfab 300 Plus


Ion Beam Deposition
from a Si target

Ion Beam Deposition of Si

 

Deposition rate: > 20 nm/min

Uniformity: < ± 0.5 % over 75 mm thick annulus


System:

Optofab 3000
= Ionfab 300 Plus modified to achieve very high rates
at excellent uniformities over small substrates

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