Plasma Technology  

Ionfab 300 Plus


Ion Beam Deposition
from a SiO2 target
with O2 assist

Ion Beam Deposition of SiO2


Ionfab 300 Plus

High Uniformity SiO2 Process
rate > 5.5 nm/ min
uniformity < ± 2 % (6")
refractive index: 1.487 ± 0.001
stress: compressive

 


Optofab 3000
= Ionfab 300 Plus modified to achieve very high rates
at excellent uniformities over small substrates

Deposition rate: > 20 nm/min
Uniformity: <± 0.5 % over 75 mm thick annulus
< ± 0.1% over 10 mm thick annulus
  centred at 75 mm substrate radius
Refractive index: 1.4868 (632.8 nm), 1.4738 (1550 nm)
RI Repeatibility: ± 0.0005
Film Stress: < 300 MPa Compressive

 

Optofab uniformity

thickness vs radius in the Optofab 3000

Sio2 IBS Dispersion

Dispersion curve in the Optofab 3000

link to homepage email to OPT