Plasma Technology  

Ionfab 300 Plus


Ion Beam Deposition
from a Ti metal target
with O2 assist

Ion Beam Deposition of TiO2

 

low power process:

Deposition rate: > 8 nm/min
Uniformity: <± 0.5 % over 75 mm thick annulus
<± 3 % over 8 substrate

high power process:

Deposition rate: > 12 nm/min
refractive index 2.468 (632nm)
Uniformity: <± 0.5 % over 75 mm thick annulus
<± 3 % over 8 substrate

System:

Optofab 3000
= Ionfab 300 Plus modified to achieve very high rates
at excellent uniformities over small substrates

 


TiO2 Ion Beam Sputtering

TiO2 IBS
refractive index vs wavelenght
(low power process)

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