Plasma Technology  

Ionfab 300 Plus


Ion Beam Deposition
from a Ta metal target
with O2 assist

Ion Beam Deposition of Ta2O5


Ionfab 300 Plus

High Uniformity Ta2O5 Process
rate > 6 nm/ min
uniformity < +/- 2 % (6")
refractive index: 2.116 ± 0.005
stress: compressive

 


Optofab 3000
= Ionfab 300 Plus modified to achieve very high rates
at excellent uniformities over small substrates

Deposition rate: > 30 nm/min
Uniformity: <± 0.5 % over 75mm thick annulus
<± 0.1 % over 10 mm thick annulus
Refractive index: 2.1585 (632.8nm), 2.0995 (1550nm)
RI Repeatibility: ±0.0014
Film Stress: < 200 MPa compressive

 

Dispersion curve SiO2 IBS

Dispersion curve in the Optofab 3000

 

 

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