SEM images of resist after Ti deposition for later lift-off.
Excellent Lift-Off properties with good side wall coverage of ~40%.
Resist shape and profile intact.
Optoelectronics feature after sputtered conformally with Titatnium
and after lift-off, well lifted structured, no defects
- Magnetron Sputtering
- Planar configuration
- Sidewall deposition ideal for lift off
- Defined lift edges
- Good side wall covergae ~40%
Plasmalab System 400with vacuum loadlock