Plasma Technology  

Silicon nanopillars

Plasmalab 80 Plus

Silicon pyramids
These were masked with a photo
process-able polyimide.

Si cones and pillars dry etching (RIE)

process sequence

Si nanopillars at 5 - 20 nm diameter
using a sputtered Ag mask

Courtesy of
Dr Parker, Dr Seeger, Prof Palmer
Nanoscale Physics Research Laboratory
The School of Physics & Astronomy
The University of Birmingham

Angle distribution of the Si cones in
dependence of the applied RIE power

Si nanopillars:
The mask is Cr sputter deposited through a polystyrene sphere raft.

RIE technology

Si nanopillars:
Cr mask, etched more than once

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