Plasma Technology  

ICP technology


This results have been obtained at
Lawrence Berkeley National laboratory
by D. L. Olynik and I. W. Rangelow

dual chamber Plasmalab System 100
with transfer loadlock and ICP380 source

Nanoscale Si Etching by Gas Chopping

-> show gas chopping principle

Reactive Ion Etching
Inductive Coupled Plasma Source
room temperature process
He backside cooling
process with gas chopping:
isotropic etch/ polymer formation

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