The SEMs show Al deposited on
1 : 1 and 2 : 1 aspect ratio Si lines.
There is a continuous metal film
on the walls, even into the notch
at the bottom corners !
Plasmalab System 400 (max 4 200 mm targets)
rate: 50 nm/ min at 5 kW
uniformity: +/- 5 % (6” wafer)
excellent step coverage
Plasmalab System 400
with vacuum loadlock