Plasma Technology  


Film Thickness vs ALD cycles:
for O2 plasma - ozone - H2O
using Ti(CpMe)(NMe2)3 at 200° C



Film Thickness vs ALD cycles:
for O2 plasma - ozone - H2O
using Ti(Cp*)(OMe)3 at 360° C

TiO2 ALD growth using Ozone


data courtesy of TU Eindhoven



FlexAL

 

 


Why Ozone ?

Ozone is more reactive then H2O,
but not as reactive as O radicals.

Ozone is sometimes preferred anyway,
when O radicals recombine to fast
for high aspect ratios.

 

OpAl

 


ALD schematic
valve between remote ICP source
and chamber,
spectroscopic ellipsometry optional

 

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