Plasma Technology  

Cross-sectional HAADF
(a) and high-resolution TEM
(b) images of AZO.
The ALD recipe existed of
3 supercycles of AlOx/ZnO.
The AZO film was 40 nm thick.
Crystal grains are visible.

Supercycle for Al doped ZnO ALD growth


Al doped ZnO ALD

precursor: DEZ
di ethyl zinc
non metal precursor: H2O

temperature controlled vapour draw

dose control by fast pulse ALD valve

doping precursors




Lower resistivity with larger
dopant precursor DMAI
courtesy of TU Eindhoven

ALD schematic
valve between remote ICP source
and chamber,
spectroscopic ellipsometry optional






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