Plasma Technology  


Cross-sectional HAADF
(a) and high-resolution TEM
(b) images of AZO.
The ALD recipe existed of
3 supercycles of AlOx/ZnO.
The AZO film was 40 nm thick.
Crystal grains are visible.


Supercycle for Al doped ZnO ALD growth

 


Al doped ZnO ALD


precursor: DEZ
di ethyl zinc
non metal precursor: H2O

temperature controlled vapour draw

dose control by fast pulse ALD valve

doping precursors

TMA

DMAI

 


Lower resistivity with larger
dopant precursor DMAI
courtesy of TU Eindhoven


ALD schematic
valve between remote ICP source
and chamber,
spectroscopic ellipsometry optional

 

 



FlexAl

 

OpAl

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