Plasma Technology  

Mr Straub uses his Plasmalab 80 Plus RIE system for II/VI RIE processes as ZnSe etching with CH4/ H2 based process chemistry.


with kind permission of:
  University of Linz
  Institut fuer Halbleiterphysik
  Hr Straub

RIE technology

Plasmalab 80 Plus

ZnSe RIE Etching

The SEM's shows 100 nm lines and dots.

rate: 15 - 25 nm/ min

selectivity to PR  20 : 1

mask used here: Ti


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