Ionfab 300 Plus

link to homepage email to OPT
Ionfab 300 Plus with loadlock/ 11 kB

Deposition Configuration

Etching Configuration

  • 13.56 MHz driven 3, 15 or 30 cm RF source
  • filamentfree Plasma Bridge Neutraliser
  • cooled substrate holder for up to 200 mm substrates
  • Helium backside cooling
  • shutter with integrated current monitor
RF ion source with PBN/ 13 kB

General

  • etch and deposition in one chamber
  • vacuum loadlock
  • Cassette loading station
  • PC control with software under Windows™

-> show load sequence

Cassette loaded Ionfab 300 Plus/ 10 kB

with Cassette Loading and square transfer station