"Inductive Coupled Plasma" with 13.56 MHz excitation
ICP is fully automatic (RF automatch unit)
no direct contact between the plasma and the substrate
older remote PECVD technology: MWDS
- lower (substrate) electrode grounded, RF driving opt.
- substrate electrode heated
- automatic height adjustment of the lower electrode opt.
- gas inlet through source and through distribution ring
- parameter: gas flows, pressure, source power, temperature
- plasma burns in the source only