PE  Plasma Etching

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Note:  The RIE and the PE mode can be combined with
           automatic switching in all OPT systems RIE/PE !

PE schematics/ 6 kB
Typical Applications:
  • isotropic low damage photoresist stripping
  • isotropic SiN removal
  • descuming (for masks)
  • plasma cleaning
  • substrate electrode on ground potential, cooled
  • top electrode RF driven (13.56 MHz)
  • shower head gas inlet (in the top electrode)
  • parameter: gas flows, pressure, RF power